Precursors for CVD Silicon Carbo-Nitride Films

ABSTRACT

Classes of liquid aminosilanes have been found which allow for the production of silicon carbo-nitride films of the general formula Si x C y N z . These aminosilanes, in contrast, to some of the precursors employed heretofore, are liquid at room temperature and pressure allowing for convenient handling. In addition, the invention relates to a process for producing such films. 
     The classes of compounds are generally represented by the formulas: 
     
       
         
         
             
             
         
       
         
         
           
             and mixtures thereof, wherein R and R 1  in the formulas represent aliphatic groups typically having from 2 to about 10 carbon atoms, e.g., alkyl, cycloalkyl with R and R 1  in formula A also being combinable into a cyclic group, and R 2  representing a single bond, (CH 2 ) n , a ring, or SiH 2 .

CROSS REFERENCE TO RELATED APPLICATION

The present patent application is a continuation application of U.S. patent application Ser. No. 12/267,790 filed Nov. 10, 2008, which is a divisional application of U.S. patent application Ser. No. 11/129,862 filed May 16, 2005, now issued U.S. Pat. No. 7,875,556.

BACKGROUND OF THE INVENTION

In the fabrication of semiconductor devices, a thin passive layer of a chemically inert dielectric material such as, silicon nitride (Si₃N₄) or silicon carbo-nitride (Si_(x)C_(y)N_(z)) is essential. Thin layers of silicon nitride function as diffusion masks, oxidation barriers, trench isolation, intermetallic dielectric material with high dielectric breakdown voltages and passivation layers. Many applications for silicon nitride coatings in the fabrication of semiconductor devices are reported elsewhere, see Semiconductor and Process technology handbook, edited by Gary E. McGuire, Noyes Publication, New Jersey, (1988), pp 289-301; and Silicon Processing for the VLSI ERA, Wolf, Stanley, and Talbert, Richard N., Lattice Press, Sunset Beach, Calif. (1990), pp 20-22, 327-330.

Many of the new semiconductor devices require dielectric films that have very low etch rates or very high film stresses, or both. It is also preferred, and sometimes necessary, that the films be formed at temperatures below 600° C. while maintaining good electrical characteristics. Film hardness is another factor to consider in the design of the electrical components and the silicon nitride films do offer extremely hard films.

One of the commercial methods for forming silicon nitride coatings employs dichlorosilane and ammonia as the precursor reactants. Low pressure chemical vapor deposition (LPCVD) using precursors such as dichlorosilane and ammonia require high deposition temperatures to get the best film properties. For example, temperatures greater than 750° C. may be required to obtain reasonable growth rates and uniformities. Other processing issues involve the hazardous aspects of chlorine and chlorine byproducts.

The following articles and patents are cited as representative of the art with respect to the synthesis of organosilanes and deposition processes employed in the electronics industry.

A. K. Hochberg and D. L. O'Meara, Diethylsilane as a Silicon Source for the Deposition of Silicon Nitride and Silicon Oxynitride Films By LPCVD, Mat. Res. Soc. Symp. Proc., Vol. 204, (1991), pp 509-514, disclose the formation of silicon nitride and silicon oxynitride films using diethylsilane with ammonia and nitric oxide by LPCVD. The deposition is carried out in a temperature range of 650° C. to 700° C. The deposition is limited generally to a temperature of 650° C. as the deposition rate drops to below 4 ANG./min at lower temperatures.

Sorita et al., Mass Spectrometric and Kinetic Study of Low-Pressure Chemical Vapor Deposition of Si ₃ N ₄ Thin Films From SiH ₂ Cl ₂ and NH ₃, J. Electro. Chem. Soc., Vol. 141, No. 12, (1994), pp 3505-3511, describe the deposition of silicon nitride using dichlorosilane and ammonia using a LPCVD process. The formation of ammonium chloride leads to particle formation and deposition of ammonium chloride at the backend of the tube and in the plumbing lines and the pumping system.

Aylett and Emsley, The Preparation and Properties of Dimethylamino and Diethylamino Silane, J. Chem. Soc. (A) p 652-655, 1967, disclose the preparation of dimethylamino and diethylaminosilane by the reaction of iodosilane with the respective dialkyl amine.

Anderson and Rankin, Isopropyldisilylamine and Disilyl-t-butylamine: Preparation, Spectroscopic Properties, and Molecular Structure in the Gas Phase, Determined by Electron Diffraction, J. Chem. Soc. Dalton Trans., p 779-783 1989 disclose the synthesis of disilyl amines of the formula NR(SiH₃)₂, e.g., isopropyldisilylamine and disilyl-t-butylamine and they provide spectroscopic comparisons to the corresponding methyldisilylamine.

Japanese Patent 6-132284 describes the formation of silicon nitride films using organosilanes having a general formula (R₁R₂N)_(n)SiH_(4-n), (where R₁ and R₂ range from H—CH₃—, C₂H₅—C₃H₇—, C₄H₉—) by either a plasma enhanced chemical vapor deposition or thermal chemical vapor deposition in the presence of ammonia or nitrogen.

U.S. Pat. No. 5,234,869 discloses the formation of a silicon nitride film by CVD using Si(N(CH₃)₂)₄ and ammonia as reactant gases. A chamber temperature of 700° C. and a pressure of 0.5 Torr was used for the deposition. Other reactants selected from the group consisting of SiH(N(CH₃)₂)₃, SiH₂(N(CH₃)₂)₂, and SiH₃(N(CH₃)₂) in combination with ammonia or nitrogen were also suggested as reactants. It was also disclosed that plasma produced by radiating the gas with an ultra-violet beam, the temperature was decreased to 300° C.

U.S. Pat. No. 5,874,368 teaches the use of bis(tertiarybutylamino)silane as a precursor to deposit silicon nitride using low pressure chemical vapor deposition at a temperature range of 500° to 800° C.

U.S. Pat. No. 5,874,368 and U.S. Pat. No. 6,153,261 disclose the formation of silicon nitride films using bis(tertiarybutylamino)silane as a silicon reactant gas. LPCVD is used to generate the film.

U.S. Pat. No. 6,391,803 discloses the formation of silicon containing thin films by atomic layer deposition using a silane of the formula Si(N(CH₃)₂)₄, SiH(N(CH₃)₂)₃ SiH₂(N(CH₃)₂)₂ SiH₃(N(CH₃)₂), preferably trisdimethylaminosilane, as a first reactant. A portion of the first reactant is chemisorbed onto the substrate and a second portion is physisorbed onto the substrate. The reactant is purged and a second reactant, i.e., NH₃ is introduced.

BRIEF SUMMARY OF THE INVENTION

Classes of liquid aminosilanes have been found which allow for the production of silicon carbo-nitride films of the general formula Si_(x)C_(y)N_(z) by CVD processes. These aminosilanes, in contrast to some of the precursors employed heretofore, are liquid at room temperature and pressure and allow for convenient handling. In addition, the invention relates to a deposition process for producing such films.

The classes of compounds are generally represented by the formulas:

and mixtures thereof, wherein R is selected from C₁-C₁₀ alkyl groups, linear, branched, or cyclic, saturated or unsaturated; aromatic, heterocyclic, or silyl in formula C, R¹ is selected from C₂-C₁₀ alkyl groups, linear, branched, or cyclic, saturated or unsaturated; aromatic, heterocyclic, hydrogen, silyl groups with or without substituents with R and R¹ in formula A also being combinable into a cyclic group (CH₂)_(n), wherein n is from 1-6, preferably 4 and 5 and R² representing a single bond, (CH₂)_(n) chain, a ring, SiR₂, or SiH₂. Preferred compounds are such that both R and R¹ have at least 2 carbon atoms. The classes of compounds are generally represented by the formulas:

and mixtures thereof, wherein R and R¹ in the formulas represent aliphatic groups typically having from 2 to about 10 carbon atoms, e.g., alkyl, cycloalkyl with R and R¹ in formula A also being combinable into a cyclic group, and R² representing a single bond, (CH₂)_(n), a ring, or SiH₂.

The precursors employed in CVD processes can achieve many advantages, and these include:

an ability to facilitate formation of dielectric films at low thermal conditions without incurring the problems of plasma deposition;

an ability to mix the aminosilanes with other precursors, e.g., ammonia at various stoichiometries, for permitting control of the ratio of Si—C bonds to Si—N bonds and thereby control the characteristics of the resulting films;

an ability to produce films having high refractive indices and film stresses;

an ability to produce films having low acid etch rates;

an ability to produce films of high densities;

an ability to generate films while avoiding chlorine contamination; and,

an ability to operate at low pressures (20 mTorr to 2 Torr) in a manufacturable batch furnace (100 wafers or more); and,

an ability to generate Si_(x)C_(y)N_(z) films at low temperatures, e.g., as low as 550° C. and below.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a plot of the stress values for films formed by the deposition of diethylaminosilane and bis(tertiary)butylamino)silane as a function of the mole ratio of NH₃ to precursor in the deposition process.

FIG. 2 is a plot of the hardness of films formed by the deposition of diethylaminosilane and bis(tertiary)butylaminosilane as a function of the temperature in the deposition process against a standard SiO₂.

FIG. 3 is a plot of the infrared spectra ion of films generated by the deposition of diethylaminosilane (neat), diethylaminosilane with NH₃ and bis(tertiary)butylamino)silane.

DETAILED DESCRIPTION OF THE INVENTION

It has been found that classes of liquid organo aminosilanes having an N—SiH₃ group as a key feature in the molecular structure are suitable as precursors for producing silicon carbo-nitride films via CVD in the electronics industry. These compounds lend themselves to the production of Si_(x)C_(y)N_(z) films under a variety of conditions.

The compounds herein are liquid at atmospheric pressure and room temperature, i.e., 25° C. and thus provide a significant advantage over the reported usage of the trimethyl substituted aminosilane. They are substituted with organo groups having at least 2 carbon atoms in the chain on the amino group providing for stability under conventional handling and processing conditions.

One class of amino silane is resented by formula A as follows:

In this class of compounds R is selected from C₁-C₁₀ alkyl groups, linear, branched, or cyclic, saturated or unsaturated; aromatic, heterocyclic. R¹ is selected from C₂-C₁₀ alkyl groups, linear, branched, or cyclic, saturated or unsaturated; aromatic, heterocyclic, hydrogen, silyl groups, with or without substituents, and R and R¹ also being combinable into a cyclic group. Representative substituents are alkyl groups and particularly the C₂₋₄ alkyl groups, such as ethyl, propyl and butyl, including their isomeric forms, cyclic groups such as cyclopropyl, cyclopentyl, and cyclohexyl. Illustrative of some of the preferred compounds within this class are represented by the formulas:

where n is 1-6, preferably 4 or 5.

The second class of aminosilane has two silyl groups pendant from a single nitrogen atom as represented by formula B.

As with the R groups of the Class A compounds, R is selected from C₂-C₁₀ alkyl groups, linear, branched, or cyclic, saturated or unsaturated; aromatic, heterocyclic. Specific R groups include methyl, ethyl, propyl, allyl, and butyl; and cyclic groups such as cyclopropyl, cyclopentyl, and cyclohexyl. Illustrative compounds are represented by the formulas:

The third class of aminosilane compound is represented by formula C. These are generally diaminodisilyl compounds with R is same as R and R¹ in formulas A and the R² group bridging the nitrogen atoms. Sometimes the R² group is nothing more than a single bond between the nitrogen atoms or it may be a bridging group, such as SiR₂, SiH₂, a chain, or a ring. The formula is as follows:

Specific examples include those represented by the formulas:

These compounds are synthesized in general by the following reactions, which are also demonstrated by Examples 1, 2, 3, and 4.

Although the above series of reactions illustrate a route to the aminosilanes as described, other sources of a silane precursor may be used. This route allows for a rather straight forward control as to whether mono and disilyl compounds are produced using the reaction stoichiometry and the use of a wide variety of amines.

Some of these compounds can also be synthesized by the reaction of monohalosilanes with corresponding amines, as described in The Preparation and Properties of Dimethylamino and Diethylamino Silane [Aylett and Emsley, J. Chem. Soc. (A) p 652-655, 1967].

XSiH₃+2RR¹NH→RR¹N—SiH₃+RR¹NH.HX

Representative amines well suited for the reaction are the alkyl, cyclic, and heterocyclic. Preferred amines are the lower alkyl amines, e.g., ethyl, iso-propyl, t-butyl, and cyclohexyl. Further the amines may be primary or secondary depending upon the product desired.

In the formation of silicon carbo-nitride films, the mono or diaminosilanes, optionally with ammonia or nitrogen source, are allowed to react in a deposition chamber at conventional deposition temperatures. Such films may be formed in deposition chambers designed for chemical vapor deposition (CVD), low pressure chemical vapor deposition (LPCVD) plasma enhanced CVD (PECVD), atomic layer deposition (ALD), and so forth. The term CVD as used herein is intended to include each of these processes which are employed in semiconductor deposition.

As stated in the advantages, the liquid aminosilanes described herein, in many cases offer the fabricator the ability to form silicon carbo-nitride films via CVD at relatively low temperatures, although a general temperature range is from 500 to 700° C. Unexpectedly, Si_(x)C_(y)N_(z) film deposition can be achieved presumably because of the high activity of the SiH₃ group(s). It is believed the low steric hindrance for the ammonia transamination reaction on the silicon center, allows these compounds to react with ammonia and deposit films with increasing nitrogen concentrations at relatively low temperatures.

The deposition of the aminosilane precursors may be carried out in the absence of, or in the presence of, an active nitrogen source such as hydrazine, dimethylhydrazine, or ammonia. Molar ratios of the nitrogen source to aminosilane generally are broadly within the range of from 0: to >10:1. The upper limit is restricted by the dilution effect on the precursor and the dilution effect will significantly diminish the deposition rate. Preferred ranges are from 0.1 to 4:1. The formation of films via deposition may also be carried out with or without other gases including with inert gases, such as nitrogen and helium. The use of gases by the fabricator to achieve corresponding dilution of the precursor may improve the conformality of the deposition or improve the penetration for chemical vapor infiltration.

Low pressure chemical vapor deposition processes (LPCVD) involve chemical reactions that are allowed to take place on a variety of substrates, e.g., silicon, within a pressure range of 20 mTorr to 20 Torr. High pressure CVD may result in gas phase nucleation or predeposition before the desired substrate is reached. Dilution of the aminosilane precursor may be required for such high pressure reactions. Low pressure deposition with some of the aminosilane precursors may exhibit rates of deposition to non-commercially usable levels. However, such aminosilanes may be suitable for atomic layer deposition.

In carrying out deposition processes, the aminosilanes described herein can be blended with other silyl precursors to alter film properties. Examples of other precursors include bis-tert-butylaminosilane, tris-iso-propylaminosilane, bis-diethylaminosilane, tris-dimethylaminosilane, and bis-iso-propylaminosilane.

The following examples are intended to illustrate various embodiments of the invention including the synthesis of various silanes and the LPCVD of silicon carbo nitride film forming precursors.

Example 1 Synthesis of Diethylaminosilane

50 grams (0.33 mol) of trifluoromethanesulfonic acid and 100 ml of toluene were added to a 250 ml flask. Under the protection of nitrogen, the flask was cooled to −40° C. 40.6 grams (0.33 mol) of tolylsilane was added slowly. Then the flask was cooled to −60° C. 33.5 grams of triethylamine was added slowly, followed by addition of 24 grams of diethylamine. After addition, the temperature of the flask was allowed to warm to room temperature gradually. Two layers of liquid were formed. The upper layer was separated using a separation funnel. 25 grams of diethylaminolsilane was obtained by vacuum distillation. The boiling point of the diethylaminolsilane was 40-42° C. at 210 mmHg.

Example 2 Synthesis of Di-Iso-Propylaminosilane

50 grams (0.33 mol) of trifluoromethanesulfonic acid and 80 ml of pentane were added to a 250 ml flask. Under the protection of nitrogen, the flask was cooled to −40° C. 35.6 grams (0.33 mol) of phenylsilane was added slowly. Then the flask was cooled to −60° C. 33.3 grams (0.33 mol) of triethylamine was added slowly, followed by addition of a solution 33.3 grams (0.33 mol) of di-iso-propylamine in 15 ml of pentane. After addition, the temperature of the flask was allowed to warm to room temperature gradually. Two layers of liquid were formed. The upper layer was separated using a separation funnel. The solvent and by product benzene were removed by distillation. 30 grams of di-iso-propylaminosilane was obtained by vacuum distillation. The boiling point of the di-iso-propylaminosilane was 55° C. at 106 mmHg.

Example 3 Synthesis of Cyclohexyldisilylamine and 2,4-Dicyclohexyl-2,4-Diaza-1,3,5-Trisilapentane

62.5 grams of trifluoromethanesulfonic acid and 100 ml of pentane were added to a 500 ml flask. Under the protection of nitrogen, the flask was cooled to −40° C. 45 grams of phenylsilane was added slowly. Then the flask was cooled to −60° C. 42 grams of triethylamine was added slowly, followed by addition of a solution 20.6 grams of cyclohexylamine in 15 ml of pentane. After addition, the temperature of the flask was allowed to warm to room temperature gradually. Two layers of liquid were formed. The upper layer was separated using a separation funnel. The solvent and by product benzene were removed by distillation. 15 grams of cyclohexyldisilylamine was obtained by vacuum distillation. The boiling point of the cyclohexyldisilylamine was 54-55° C. at 17 mmHg. The remaining high boiling point portion contains 96.6% 2,4-dicyclohexyl-2,4-diaza-1,3,5-trisilapentane.

Example 4 Synthesis of Cyclohexyldisilylamine and 2,4-Di-Tert-Butyl-2,4-Diaza-1,3,5-Trisilapentane

50.0 grams (0.33 mol) of trifluoromethanesulfonic acid and 100 ml of pentane were added to a 500 ml flask. Under the protection of nitrogen, the flask was cooled to −40° C. 35.6 grams (0.33 mol) of phenylsilane was added slowly. Then the flask was cooled to −60° C. 33.3 grams (0.33 mol) of triethylamine was added slowly, followed by addition of a solution 28.7 grams (0.165 mol) of bis-t-butylaminosilane in 15 ml of pentane. After addition, the temperature of the flask was allowed to warm to room temperature gradually. Two layers of liquid were formed. The upper layer was separated using a separation funnel. The solvent and by product benzene were removed by distillation. 21 grams of 2,4-di-tert-butyl-2,4-diaza-1,3,5-trisilapentane was obtained by vacuum distillation.

Example 5 Formation of Silicon Carbo Nitride Film Using Diethylaminosilane Precursor General Procedure

The aminosilane precursors are tested in an LPCVD reactor used to qualify experimental precursors for silicon carbo-nitride depositions. The precursors are degassed and metered into the reactor through a low-pressure mass flow controller (MFC) as required. The MFC flows are calibrated against weight losses of the chemicals vs. time of flow. Additional reactants, such as ammonia, and diluents, such as nitrogen and helium, as specified are also metered into the reactor through calibrated MFCs, as required. The reactor is connected to a roots blower/dry pump combination capable of evacuating the reactor to below 10⁻⁴ Torr (0.013 Pa). The temperature across a load of silicon wafers, during deposition, is within 1° C. of the set point.

Silicon wafers are loaded onto a quartz boat and inserted in the reactor. The reactor is pumped to base pressure and checked for leaks. The system is ramped to the process temperature with gas flows that would dilute any residual oxygen or moisture to prevent any oxidation of the silicon wafers as the reactor heats up. The reactor is then stabilized for a predetermined time to bring all wafer surfaces to an equal temperature (as had been determined by previous measurements on wafers with attached thermocouples).

The gases and vapors are injected into the reactor for a predetermined deposition time at a controlled pressure. Next, the gases are shut off, and the reactor is pumped to a base pressure. The reactor, then, is pump-purged, pumped down, and pump-purged to clear any reactive gases or vapors as the reactor is cooled down. The reactor is backfilled to atmospheric pressure; the wafers are removed and allowed to cool to room temperature. The deposited films are then measured for film thickness, film refractive index, film stress (FIG. 1), infrared absorbances (shown in FIG. 3), dielectric constant, and acid etch rate (Table 1).

In forming the deposited films, 10 sccm of diethylaminosilane (DEAS) was flowed into a reactor at 570° C. along with 20 sccm NH₃ and 20 sccm N₂ at 1.3 Torr (173.3 Pa) for a deposition time of 60 minutes.

The average film thickness was 69 nm and refractive index was 2.045. The film stress was measured as 1.07×10¹⁰ dynes/cm² (1.07 GPa).

The infrared spectra were dominated by Si—C and Si—N absorptions. C—H or C—N absorptions were in the noise illustrating, as shown in FIG. 3, the film composition was largely in the form of Si_(x)C_(y)N_(z) as is desired.

Example 6 Formation of Silicon Carbo-Nitride Film Using Diethylaminosilane Precursor Using N₂ without NH₃

The procedure of Example 4 was followed with the exception of process conditions. Nitrogen was used in place of NH₃. In this example, 10 sccm of diethylaminosilane (DEAS) was flowed into a reactor at 600° C. with 40 sccm N₂ at 1.0 Torr (133 Pa) for a deposition time of 40 minutes.

The average film thickness was 42 nm and refractive index was 2.288. The film stress was measured as 1.34×10¹⁰ dynes/cm². These films have even higher stresses and lower etch rates than those obtained with ammonia (See Table 1 for etch rates). The conformalities of such films were found to be 100% on isolated structures.

Example 7 Formation of Silicon Carbo-Nitride Film Using Diisopropylaminosilane Precursor Using N₂ without Nh₃

The procedure of Example 5 was followed with the exception of the precursor. 10 sccm of diisopropylaminosilane (DIPAS) was flowed into a reactor at 570° C. with 20 sccm He and 20 sccm N₂ at 1.0 Torr (133 Pa) for a deposition time of 70 minutes.

The average film thickness was 46 nm and refractive index was 2.056. The film stress was measured as 1.07×10¹⁰ dynes/cm². Surprisingly, the refractive index and stress were similar for diisopropylaminosilane to that of the precursor of Example 6. These results show excellent stress values within this class of materials can be achieved.

Example 8 Formation of Silicon Carbo-Nitride Film Using Bis(Tertiary Butylamino)Silane Precursor as a Control Using N₂ without NH₃

The procedure of Example 5 was followed with the exception of the precursor and it was used as a control. BTBAS is a precursor used in production processes worldwide and it was chosen as the representative aminosilane comparison because of its well accepted performance characteristics.

10 sccm of bis(tertiary butylaminosilane) (BTBAS) was flowed into a reactor at 570° C. with 20 sccm He and 20 sccm N₂ at 1.0 Torr (133 Pa) for a deposition time of 70 minutes. These films have only 20% of the stress and less than 10% of the etch resistance of the mono-aminosilanes (See Table 1).

FIG. 1 was generated using the stress data with respect to bis(tertiary butylaminosilane) and diethylaminosilane. It shows the results of stress measurements using an FSM system. The results for diethylaminosilane were unexpected, i.e., a high stress at a low NH₃:DEAS ratio was achieved including that of maintaining a high stress modest NH₃:DEAS ratios.

Precursors such as bis(tertiarybutylamino)silane and dichlorosilane produce films that have decreasing stresses as the ammonia to chemical ratio is decreased. At a low NH₃:BTBAS ratio stress results are poor. Reducing the ammonia for these precursors creates a silicon rich film and this reduces the thermal expansion coefficients of these films relative to the silicon substrate. Although not intending to be bound by theory, reducing the ammonia:DEAS ratio in the deposition process increases the Si to N atomic ratio, the effect is that the C to Si atomic ratio increases. Apparently, then, there is some replacement of Si—N with Si—C bonds and these bonds result in producing films having similar stress.

A second component of the example was the measurement of film hardness. It was measured by indentation using a Hysitron system. FIG. 2 is a plot which shows the deposited film hardness. When diethylaminosilane was used as the precursor as compared to a BTBAS deposition and to thermally grown silicon dioxide harder films were obtained. Harder films are more protective of underlying layers and themselves in chemical-mechanical polishing (CMP) operations. This property, too, was surprising.

Example 9 Etch Resistance of Silicon Nitride and Silicon Carbo-Nitride Films

In this example, the results of etching of various silicon nitride and silicon carbo-nitride films are set forth in Table 1. Table 1 displays the results of etching films from several precursors in 1% (of 49%) HF. The etch rates are given relative to those of thermally grown silicon dioxide that were etched at the same time. The lower the etch rate of a film, the better it is for maintaining geometries and protecting underlying layers as undesired silicon dioxide is removed.

TABLE 1 Comparison of film etch rates in 1% of 49% HF at 24° C. 1% HF Etch Deposition Rate NH₃ Temperature, Relative Chemical ratio ° C. to SiO₂ BTBAS 2:1 570 0.188 BTBAS 0 570 0.018 DEAS 2:1 570 0.006 DEAS 4:1 570 0.008 DEAS 1:1 570 0.009 DEAS 0 570 0.001 DIPAS 2:1 570 0.006 DIPAS 0 570 0.006 BTBAS = bis(tertiarybutylamino)silane DEAS = diethylaminosilane DIPAS = diisopropylaminosilane

From the above Table 1, DEAS is shown to have excellent low etch rates at NH₃ to precursor ratios of from 0 to 2. On the other hand, a ratio of NH₃:BTBAS, even at an NH₃:BTBAS ratio of 0:1:1 gave higher etch rates, than DEAS at a 2:1 ratio. Excellent low etch rates are shown at low NH₃:BTBAS ratios, but recall with BTBAS stress levels are poor at the low NH₃:BTBAS level.

Summarizing, dielectric silicon carbo-nitride films of the formula, Si_(x)C_(y)N_(z), can be produced from the classes of aminosilanes as described, by CVD and other deposition processes. It is believed the high activity of the SiH₃ group allows for the production of Si_(x)C_(y)N_(z) film depositions at temperatures as low as 550° C. whereas many of the precursors for forming Si_(x)C_(y)N_(z) films do not perform well.

It is believed, also, the low steric hindrance for the ammonia transamination reaction on the silicon center allows these compounds to react with ammonia and form films with increasing nitrogen concentrations at relatively low temperatures. Ligands such as ethyl, isopropyl, butyl, etc. act as good leaving groups as they become volatile byproducts by beta-hydride elimination. Any carbon left behind is bonded to silicon. In contrast, aminosilane precursors which have methyl groups as reported in the past do not have this dissociation route. They remain bonded to the nitrogen and can be incorporated and trapped in the growing film. The presence of such trapped methyl groups are easily distinguished in infrared spectra (see FIG. 3). Here, though, the absence of a C—H peak in FIG. 3 indicates that there can be only be a very low level of hydrocarbon trapped in the film. 

1. A method of making an aminosilane represented by the following formulas A or B:

wherein R and R¹ are each selected from the group consisting of C₂ to C₁₀ alkyl groups, branched, or cyclic, saturated or unsaturated, aromatic, heterocyclic, with or without substituents and alkylamino groups; and R and R¹ in formula A can also be formed into a cyclic group, the method comprising the steps of: providing a reaction mixture comprising an amine selected from the group consisting of a secondary amine or a primary amine; and adding to the reaction mixture an arylsilane and a sulfonic acid wherein the arylsilane and sulfonic acid react to form an intermediate and wherein the amine reacts with the intermediate to provide the aminosilane having the formula A or B.
 2. The method of claim 1 wherein the method further comprises: separating the aminosilane having the formula A or B from the reaction mixture.
 3. The method of claim 1 wherien the alkyl amine comprises one selected from the group consisting of ethyl, isopropyl, sec-butyl, t-butyl, or cyclohexyl.
 4. The method of claim 3 wherein the alkyl amine comprises di-iso-propylamine.
 5. The method of claim 3 wherein the alkyl amine comprises diethylamine.
 6. The method of claim 1 wherein the reaction mixture further comprises a solvent.
 7. The method of claim 1 wherein the reaction mixture further comprises triethylamine.
 8. The method of claim 1 wherein the arylsilane comprises phenylsilane.
 9. The method of claim 1 wherein the arylsilane comprises tolylsilane.
 10. The method of claim 1 wherein the aminosilane comprises diethylaminosilane.
 11. The method of claim 1 wherein the aminosilane comprises diisopropylaminosilane.
 12. The method of claim 1 wherein the aminosilane comprises 2,4-di-tert-butyl-2,4-diaza-1,3,5-trisilapentane.
 13. The method of claim 1 wherein the aminosilane comprises 2,4-dicyclohexyl-2,4-diaza-1,3,5-trisilapentane.
 14. The method of claim 1 wherein the reaction mixture is cooled to a temperature of −40° C. prior to the adding step.
 15. The method of claim 1 wherein the sulfonic acid comprises trifluoromethanesulfonic acid.
 16. A method of making diisopropylaminosilane, the method comprising the steps of: providing a reaction mixture comprising diisopropylamine; adding to the reaction mixture an arylsilane and a sulfonic acid wherein the arylsilane and sulfonic acid react to form an intermediate and wherein the diisopropylamine reacts with the intermediate to provide diisopropylaminosilane.
 17. The method of claim 16 wherein the arylsilane comprises phenylsilane.
 18. The method of claim 16 wherein the reaction mixture further comprises triethylamine.
 19. The method of claim 16 wherein the sulfonic acid comprises trifluoromethanesulfonic acid.
 20. A method of making diethylaminosilane, the method comprising the steps of: providing a reaction mixture comprising diethylamine; and adding to the reaction mixture an arylsilane and a sulfonic acid wherein the arylsilane and sulfonic acid react to form an intermediate and wherein the diisopropylamine reacts with the intermediate to provide diethylaminosilane.
 21. The method of claim 20 wherein the aryl silane comprises phenylsilane.
 22. The method of claim 20 wherein the reaction mixture further comprises triethylamine.
 23. The method of claim 20 wherein the sulfonic acid comprises trifluoromethanesulfonic acid.
 24. A method of forming via a vapor deposition process a dielectric film having the formula Si_(x)C_(y)N_(z), the method comprising: providing a substrate within a vapor deposition chamber; introducing into the vapor deposition chamber an aminosilane comprising the following formula A:

wherein R and R¹ are each independently selected from the group consisting of isopropyl, t-butyl, sec-butyl, t-pentyl, sec-pentyl, cyclopropyl, cyclopentyl, and cyclohexyl groups; and introducing a nitrogen source selected from the group consisting of hydrazine, dimethyl hydrazine, or ammonia into the vapor deposition chamber wherein the nitrogen source reacts with the aminosilane to provide the dielectric film on the substrate wherein the dielectric film is formed at a temperature of 550° C. or less.
 25. The method of claim 24 wherein the vapor deposition process is at least one selected from chemical vapor deposition, low pressure chemical vapor deposition, plasma enhanced chemical vapor deposition, and atomic layer deposition.
 26. The method of claim 25 wherein the vapor deposition process is chemical vapor deposition.
 27. The method of claim 25 wherein the vapor deposition process is atomic layer deposition.
 28. The method of claim 24 further comprising: introducing an inert gas into the vapor deposition chamber.
 29. The method of claim 24 further comprising: introducing a precursor selected from the group consisting of bis-tert-butylaminosilane, tris-iso-propylaminosilane, bis-diethylaminosilane, tris-dimethylaminosilane, and bis-iso-propylaminosilane into the vapor deposition chamber.
 30. The method of claim 24 wherein a mole ratio of nitrogen source to aminosilane precursor ranges from 0:1 to 10:1.
 31. The method of claim 30 wherein the mole ratio of nitrogen source to aminosilane precursor ranges from 0:1 to 4:1.
 32. A method of forming via a vapor deposition process a dielectric film having the formula Si_(x)C_(y)N_(z), the method comprising: providing a substrate within a vapor deposition chamber; introducing into the vapor deposition chamber an aminosilane comprising the following formula B:

wherein R is selected from the group consisting of t-pentyl and cyclohexyl groups; and introducing a nitrogen source selected from the group consisting of hydrazine, dimethyl hydrazine, or ammonia into the vapor deposition chamber wherein the nitrogen source reacts with the aminosilane to provide the dielectric film on the substrate wherein the dielectric film is formed at a temperature of 550° C. or less.
 33. The method of claim 32 wherein the vapor deposition process is at least one selected from chemical vapor deposition, low pressure chemical vapor deposition, plasma enhanced chemical vapor deposition, and atomic layer deposition.
 34. The method of claim 33 wherein the vapor deposition process is chemical vapor deposition.
 35. The method of claim 33 wherein the vapor deposition process is atomic layer deposition.
 36. The method of claim 32 further comprising: introducing an inert gas into the vapor deposition chamber.
 37. The method of claim 32 further comprising: introducing a precursor selected from the group consisting of bis-tert-butylaminosilane, tris-iso-propylaminosilane, bis-diethylaminosilane, tris-dimethylaminosilane, and bis-iso-propylaminosilane into the vapor deposition chamber.
 38. The method of claim 32 wherein a mole ratio of nitrogen source to aminosilane precursor ranges from 0:1 to 10:1.
 39. The method of claim 38 wherein the mole ratio of nitrogen source to aminosilane precursor ranges from 0:1 to 4:1.
 40. A method of forming via a vapor deposition process a dielectric film having the formula Si_(x)C_(y)N_(z), the method comprising: providing a substrate within a vapor deposition chamber; introducing into the vapor deposition chamber an aminosilane comprising the following formula C:

wherein R is selected from a C₁-C₁₀ linear alkyl group; a C₃-C₁₀ branched or cyclic groups; an aromatic group; a C₃-C₁₀ heterocyclic group; or a silyl group, and R² representing a single bond, a (CH₂)_(n) chain wherein n is from 1-6, a ring, SiR₂, or SiH₂; and introducing a nitrogen source selected from the group consisting of hydrazine, dimethyl hydrazine, or ammonia into the vapor deposition chamber wherein the nitrogen source reacts with the aminosilane to provide the dielectric film on the substrate wherein the dielectric film is formed at a temperature of 550° C. or less.
 41. The method of claim 40 wherein the vapor deposition process is at least one selected from chemical vapor deposition, low pressure chemical vapor deposition, plasma enhanced chemical vapor deposition, and atomic layer deposition.
 42. The method of claim 41 wherein the vapor deposition process is chemical vapor deposition.
 43. The method of claim 41 wherein the vapor deposition process is atomic layer deposition.
 44. The method of claim 40 further comprising: introducing an inert gas into the vapor deposition chamber.
 45. The method of claim 40 further comprising: introducing a precursor selected from the group consisting of bis-tert-butylaminosilane, tris-iso-propylaminosilane, bis-diethylaminosilane, tris-dimethylaminosilane, and bis-iso-propylaminosilane into the vapor deposition chamber.
 46. The method of claim 40 wherein a mole ratio of nitrogen source to aminosilane precursor ranges from 0:1 to 10:1.
 47. The method of claim 46 wherein the mole ratio of nitrogen source to aminosilane precursor ranges from 0:1 to 4:1.
 48. A composition for depositing a dielectric film comprising: an aminosilane comprising the following formula A:

wherein R and R¹ are each independently selected from the group consisting of isopropyl, t-butyl, sec-butyl, t-pentyl, sec-pentyl, cyclopropyl, cyclopentyl, and cyclohexyl groups; and optionally a precursor selected from the group consisting of bis-tert-butylaminosilane, tris-iso-propylaminosilane, bis-diethylaminosilane, tris-dimethylaminosilane, and bis-iso-propylaminosilane.
 49. The composition of claim 48 wherein R and R¹ are combined into a cyclic group.
 50. The composition of claim 48 wherein R and R¹ are isopropyl groups.
 51. The composition of claim 48 wherein R and R¹ are sec-butyl groups.
 52. The composition of claim 48 wherein the precursor comprises bis-tert-butylaminosilane.
 53. The composition of claim 48 wherein the precursor comprises tris-iso-propylaminosilane.
 54. The composition of claim 48 wherein the precursor comprises bis-diethylaminosilane.
 55. The composition of claim 48 wherein the precursor comprises tris-dimethylaminosilane.
 56. The composition of claim 48 wherein the precursor comprises bis-iso-propylaminosilane.
 57. A composition for depositing a dielectric film comprising: an aminosilane comprising the following formula B:

wherein R is selected from the group consisting of t-pentyl and cyclohexyl groups; and optionally a precursor selected from the group consisting of bis-tert-butylaminosilane, tris-iso-propylaminosilane, bis-diethylaminosilane, tris-dimethylaminosilane, and bis-iso-propylaminosilane.
 58. The composition of claim 57 wherein R is t-pentyl.
 59. The composition of claim 57 wherein R is cyclohexyl.
 60. The composition of claim 57 wherein the precursor comprises bis-tert-butylaminosilane.
 61. The composition of claim 57 wherein the precursor comprises tris-iso-propylaminosilane.
 62. The composition of claim 57 wherein the precursor comprises bis-diethylaminosilane.
 63. The composition of claim 57 wherein the precursor comprises tris-dimethylaminosilane.
 64. The composition of claim 57 wherein the precursor comprises bis-iso-propylaminosilane.
 65. A composition for depositing a dielectric film comprising: an aminosilane comprising the following formula C:

wherein R is selected from a C₁-C₁₀ linear alkyl group; a C₃-C₁₀ branched or cyclic groups; an aromatic group; a C₃-C₁₀ heterocyclic group; or a silyl group, and R² representing a single bond, a (CH₂)_(n) chain wherein n is from 1-6, a ring, SiR₂, or SiH₂; and optionally a precursor selected from the group consisting of bis-tert-butylaminosilane, tris-iso-propylaminosilane, bis-diethylaminosilane, tris-dimethylaminosilane, and bis-iso-propylaminosilane.
 66. The composition of claim 65 wherein the precursor comprises bis-tert-butylaminosilane.
 67. The composition of claim 65 wherein the precursor comprises tris-iso-propylaminosilane.
 68. The composition of claim 65 wherein the precursor comprises bis-diethylaminosilane.
 69. The composition of claim 65 wherein the precursor comprises tris-dimethylaminosilane.
 70. The composition of claim 65 wherein the precursor comprises bis-iso-propylaminosilane.
 71. An aminosilane compound selected from the group having the following formulas:


72. The aminosilane of claim 71 comprising:


73. The aminosilane of claim 71 comprising:


74. The aminosilane of claim 71 comprising:


75. The aminosilane of claim 71 comprising:


76. The aminosilane of claim 71 comprising:


77. An aminosilane compound selected from the group consisting of:

and where n is 4 or
 5. 78. The aminosilane of claim 77 comprising:


79. The aminosilane of claim 77 comprising:


80. The aminosilane of claim 77 comprising:


81. The aminosilane of claim 77 comprising:

wherein n is 4 or
 5. 82. An aminosilane selected from the group consisting of:


83. The aminosilane of claim 82 comprising:


84. The aminosilane of claim 82 comprising:


85. The aminosilane of claim 82 comprising: 